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> Astex AX7610 rf F120101 sapphire plasma source tube
Astex AX7610 rf F120101 sapphire plasma source tube
Astex AX7610 RF F120101 Sapphire Plasma Source Tube
Astex AX7610 RF F120101 Sapphire Plasma Source Tube, Rev K
Astex Mod. AX7610-4 Chemical Downstream Plasma Source
Used on Gasonics/Novellus PEP Iridia systems
We are unable to test this unit - it was part of a "clean-out"
There are a few scratches on the outer case.
OEM data at: http:// /docs/UR/ASTEXax7610DS.pdf
The AX7610 is a microwave plasma source for downstream chemical etch applications, such as photoresist stripping and hard mask removal. With replaceable quartz or sapphire tubes, the AX7610 downstream source offers flexibility of configuration to meet the most demanding application process parameters. The quartz tube version is ideally suited for production of atomic oxygen for resist stripping. The sapphire tube version is compatible with much more severe CF4 and NF3 chemistries for isotopic etch and other applications.
